Grow of nanofilms by physical vapor deposition techniques
Physical vapor deposition (PVD) techniques have played a prominent role in the development of nanoscience and nanotechnology during the last decades and it will continue to be so for many years to come. As the field advances it is of valuable importance to study the most popular PVD techniques involved in the growth of thin and ultrathin films. In this course, we shall review the processes occurring during the deposition of atomic layers and we shall discuss the instrumentation and PVD techniques used in the fabrication of nanofilms.
Contents
Growth mechanisms of atomic layers in PVD processes
Arrival of atoms from the vapor phase
Absorption and desorption of atoms
Superficial Diffusion
Incorporation to the surface
Nucleation and early stages of growth
Growth of continuous layers
Growth modes
Instrumentation involved in PVD techniques
Vacuum chambers
Vacuum system
Residual gas monitoring
Pressure measurement
Substrate heater
Temperature measurement
Thickness monitoring
Substrate selection and preparation of atomically clean surfaces
